Materials & Nanoscience

Natural to Nanosphere Lithographies: Two Decades of Self-assembled Advanced Materials (#177)

Twenty years ago, the term ‘nanosphere lithography’ (NSL) was coined (1995-20 years before Pacifichem 2015). It joined the blossoming field of ‘natural lithography’ with large-area self-assemblies of nanometer-sized spheres. Initially, the large arrays of spheres were used as physical shadow masks for metal evaporation-enabling plasmonic structures and surface plasmon-enhanced techniques, such as surface-enhanced Raman scattering and surface-enhanced infrared emission. The method has since been bolstered with conformal deposition techniques, such as atomic layer deposition, and angle- resolved deposition to produce photonic crystals and many other geometric nano-objects.
At present, there are over a thousand publications based on natural or nanosphere lithographies, and this number is growing exponentially. The method is broadly applicable to many disciplines and has been very popular for cross-discipline projects. As such, this technique has had a continuing impact on materials science, spectroscopy, biochemistry, and optics. The aim of this Symposium will be to explore the current contribution of nanosphere or natural lithographies on nano-materials and nano-optics and to promote a popular multidisciplinary technique to a broad audience. The main areas that will be considered for this Symposium are: optoelectronics, plasmonics, and high-surface area arrays for electrical and biological applications.
Last update: Dec 28, 2015